NTD20P06LT4G
Part Number: NTD20P06LT4G
Manufacturer: Onsemi
Description: MOSFET P-CH 60V 15.5A DPAK
Shipped from: Shenzhen/HK Warehouse
Stock Available: Check with us
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Part Number: NTD20P06LT4G
Manufacturer: Onsemi
Description: MOSFET P-CH 60V 15.5A DPAK
Shipped from: Shenzhen/HK Warehouse
Stock Available: Check with us
| Datasheet | |
|---|---|
| Category | Discrete Semiconductor Products |
| Family | Transistors – FETs, MOSFETs – Single |
| Manufacturer | ON Semiconductor |
| Series | – |
| Packaging | Tape & Reel (TR) |
| FET Type | MOSFET P-Channel, Metal Oxide |
| FET Feature | Standard |
| Drain to Source Voltage (Vdss) | 60V |
| Current – Continuous Drain (Id) @ 25°C | 15.5A (Ta) |
| Rds On (Max) @ Id, Vgs | 150 mOhm @ 7.5A, 5V |
| Vgs(th) (Max) @ Id | 2V @ 250μA |
| Gate Charge (Qg) @ Vgs | 26nC @ 5V |
| Input Capacitance (Ciss) @ Vds | 1190pF @ 25V |
| Power – Max | 65W |
| Operating Temperature | -55°C ~ 175°C (TJ) |
| Mounting Type | Surface Mount |
| Package / Case | TO-252-3, DPak (2 Leads + Tab), SC-63 |
| Supplier Device Package | DPAK |
This power MOSFET from ON Semiconductor, model number NTD20P06LT4G, can be utilized for boosting electronic signals and switching between different electronic signals. It can dissipate up to 65000 mW of power at its highest capacity. This component will be packaged in tape and reel form for shipment to facilitate efficient mounting and ensure that it is delivered securely. This MOSFET transistor has an enhancement mode of operation and uses the P channel.
This MOSFET transistor can operate from -55 degrees Celsius to 175 degrees Celsius. The minimum operating temperature is -55 degrees Celsius.
When two materials with a significant amount of p-type doping are coupled to an N-channel substrate with a low amount of n-type doping, an N-channel MOSFET is created. Doping is the practice of deliberately introducing a trace amount of an impure substance into the atomic structure in the hope of eluding detection by the authorities.
A P-channel MOSFET’s functionality is determined by the channel’s concentration of the majority of charge carriers and whether it is created or already exists. In this particular instance, the holes constitute the majority of the carriers.
The n-substrate of this MOSFET has only a trace amount of dopant inserted into it during the design process. The length is the factor that differentiates the two severely doped p-type materials from one another (L). This value, denoted by the letter L, is referred to as the channel length.
After first coating the substrate with a layer of silicon dioxide, the substrate is subjected to having a thin layer deposited on it. This layer is typically referred to as the dielectric layer among industry professionals. The two P types each comprise the circuit’s source or drain. The gate terminal is made of aluminum plating placed over the dielectric material. The ground connection can be found at the MOSFET’s source and body.
It has been determined that the gate terminal requires a voltage in the negative range. Because of the action of capacitance, the positive concentration of charges will eventually get settled lower at the layer that is termed dielectric. Because of the repulsive forces, the electrons at the n substrate shift, and the value of the uncovered positive ions layer can be discovered there. This occurs because the n substrate is an insulator. In an n-type substrate, the holes, which make up a minority of the carriers, unite with a small number of the substrate’s electrons to create bonds.
However, continued application of the negative voltage dissolves the covalent bonds, and, as a result, the pairs that were generated between electrons and holes also break apart. This formation results in the development of holes, which in turn produces an increase in the carrier concentration of holes in the channel, increasing the holes’ concentration. Since the channel becomes conductive when a negative voltage is supplied to the drain terminal of the transistor, this causes the transistor to experience a flow of current.
Unlike the n channel, the p channel of a metal-oxide-semiconductor field-effect transistor depletes oppositely. This is because the p channel is complementary to the n channel (MOSFET). In this material, the channel is already pre-built due to p-type impurities. When a negative voltage is given to the terminal gate, the open holes that represent the n-type minority carriers are pulled to the channel that is occupied by the positively ionized impurity. When a drain terminal is reverse-biased, device conduction begins; however, raising the negative voltage at the drain terminal results in the development of the depletion layer.
This area of the room will be directly impacted by the thickness of the layer that develops as a consequence of the presence of positive ions. The conductivity value of the channel is directly affected by the size of the depletion area that it contains. It is possible to direct the current flowing through the terminal in a variety of different patterns by altering the voltage in the surrounding area. In summary, the drain and the gate exhibit a negative polarity throughout. However, the source always stays within its initial value of zero.
The source and drain voltage are increasing while the drain current is decreasing. This may be because the drain and the source are connected to the same source. On the other hand, the magnitude of the drain current is growing in the other direction. This is an example of how the component functions in the ohmic region.
The only important difference that can be found between the p channel and the n channel is the polarity of the signal that is transmitted via them. Other than that, the features of the p channel are similar to those of the n channel. This is because the values of the substrates are not comparable to one another in any way.
The ON Semiconductor NTD20P06LT4G is a power MOSFET with multiple applications, including signal amplification and switching.
It can dissipate power up to 65 watts. Tape and reel packing will be used to ship this part to ensure its safe arrival and easy installation. This metal-oxide-semiconductor field-effect transistor operates in the enhancement mode. The temperature tolerance of this MOSFET transistor is -55 to 175 degrees Celsius.
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